对薄膜生长的方法之一磁控溅射的过程模拟，采用蒙特卡罗方法。-pair of thin film growth method magnetron sputtering process simulation, using the Monte Carlo method.

用蒙特卡罗方法实现Ising模型，以一个概率模型为基础，按照这个模型所描绘的过程，通过模拟实验的结果，作为问题的近似解-Approximate solution of the Ising model using the Monte Carlo method, based on a probabilistic model for in accordance with the process depicted in this model, the simulation results, as the

气体扩散达到平衡状态的过程模拟 C++编辑，蒙特卡罗方式，tmcs时步-The gas diffusion equilibrium analog C++ edit, Monte Carlo, TMCS step